Analysis Service for Industry and Research

English (UK) Français (FR)
Different types of analysis: SIMS: Secondary ions mass spectrometry - TOF-SIMS: Time of flight SIMS - XPS: X-ray photoelectron spectrometry - RBS: Rutherford back scattering - ECVP: Electrochemical capacitance voltage profiling...

Different types of analysis: SIMS: Secondary ions mass spectrometry - TOF-SIMS: Time of flight SIMS - XPS: X-ray photoelectron spectrometry - RBS: Rutherford back scattering - ECVP: Electrochemical capacitance voltage profiling...

Figures and estimates

Dynamic SIMS Detection limit 1ppm-1ppb
Standard mass range 1amu-300amu
Profile depth 10nm-100µm
Depth resolution 1nm-20nm
Analysis area (diameter) 20µm-500µm
XPS/ECSA Detection limit 0,1at%
Detected elements All except H and He
Analysis depth (without abrasion) 10nm
Minimum analysis area (diameter) 10µm
ToF-SIMS Detection limit 1ppm
Mass range 1amu-10000amu
Analysis depth (without abrasion) 1nm
Imaging spatial resolution 0,1µm
RBS Detection limit 1at%
Mass range M>10amu
Analysis depth 3nm-3µm
ECVP Detection limit 1ppm-1ppb
Profile depth 10nm-10µm
Analysis area (diameter) 1mm-3mm
FIB-TEM Imaging spatial resolution 0,1nm
Figures and estimates of the different analysis techniques